Microfabrication: Dual Beam

The focused electron and ion beam lithography is a mature technology, used in industry and at laboratory level since the last 20 years. This technology plays nowadays a major role in the context of Nanotechnology. Currently, electron beams focused to 1 nm and ion beams focused to 5 nm integrate the state-of-the-art electron and ion columns devoted to nanolithography. Together with dedicated electron or ion beam equipments, another option is to combine both types of columns in a single instrument, which is coined dual beam or cross beam, depending on the supplier.